| 标题 |
Plasma resistance and etching behavior of APS Y2O3 coatings modified via NH4F immersion process |
| 网址 | |
| DOI | |
| 其它 |
期刊:Materials Chemistry and Physics 作者:Jiwon Choi; Daegeun Kim; Hyewon Seok; Kangduk Kim 出版日期:2026-04-01 |
| 求助人 | |
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(2025-6-4)