| 标题 |
 Unraveling the reaction mechanisms in a chemically-amplified EUV photoresist from a combined theoretical and experimental approach |
| 网址 | |
| DOI |
10.1117/12.3051002
doi
|
| 其它 |
期刊：Advances in Patterning Materials and Processes XLII 作者：Laura Galleni; Dhirendra P. Singh; Thierry Conard; Geoffrey Pourtois; Paul A. W. van der Heide; et al 出版日期：2025-04-23 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时，文件已从服务器自动删除，无法下载。 |
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(2025-6-4)
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