| 标题 |
Control of edge bulge evolution during photoresist reflow and its application to diamond microlens fabrication |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Hangyu Liu; Johannes Herrnsdorf; Erdan Gu; Martin D. Dawson 出版日期:2016-03-01 |
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(2025-6-4)