| 标题 |
Dry etch patterning properties of organic underlayer used on EUV metal oxide resist platform |
| 网址 | |
| DOI |
10.1117/12.3091544
doi
|
| 其它 |
期刊:Advanced Etch Technology and Process Integration for Nanopatterning XV 作者:Viktor Kampitakis; Achintya Kundu; Mihir Gupta; Remi Vallat; Hyo Seon Suh; et al 出版日期:2026-04-10 |
| 求助人 | |
| 下载 |
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(2025-6-4)