| 标题 |
An x-ray diffraction and Raman spectroscopic analysis of thin-films of silicon grown by ultrahigh-vacuum evaporation and the thin-film silicon continuum |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Applied Physics 作者:Sin Hang Cheung; David J. Lockwood; Jean-Marc Baribeau; Stephen K. O’Leary 出版日期:2025-04-04 |
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(2025-6-4)