| 标题 |
Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:K. Otaki; T. Yamamoto; Y. Fukuda; K. Ota; I. Nishiyama; et al 出版日期:2002-01-01 |
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(2025-6-4)