| 标题 |
Optimization of process parameters to control diameter fluctuation during the monocrystalline silicon growth by hybrid neural network model and genetic algorithm |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Crystal Growth 作者:Jun Xiao; Qitao Zhang; Tai Li; Peilin He; Yuwei Wang; et al 出版日期:2025 |
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