| 标题 |
Radical, ion, and photon’s effects on defect generation at SiO2/Si interface during plasma etching |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied Surface Science 作者:Shota Nunomura; Takayoshi Tsutsumi; Noriharu Takada; Masanaga Fukasawa; Masaru Hori 出版日期:2024-07-18 |
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(2025-6-4)