Lv11
30 积分 2026-05-23 加入
Cryogenic cyclical etching of Si using CF4 plasma passivation steps: The role of CF radicals
27分钟前
待确认
Optical emission spectroscopy as a method for evaluating the change in Si etching structures profile in ICP SF6/C4F8 plasma: Microstructures
53分钟前
已完结
Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas
58分钟前
已完结
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