Lv11
28 积分 2026-05-23 加入
Density functional theory study on the modification of silicon nitride surface by fluorine-containing molecules
2小时前
待确认
SiO2 etch-damage mitigation in fluorocarbon C 4 F 8 plasma: CF x polymer deposition and polyatomic ion effects
5天前
已完结
SiO2 etch-damage mitigation in fluorocarbon C F plasma: CF polymer deposition and polyatomic ion effects
5天前
已关闭
Hybrid quantum computing strategies for end-to-end atomistic modeling of etch chemistry: Ab initio calculations and machine learning
5天前
已完结
Reaction engineering of radical-molecular fluorine species in pulsed NF3 plasma for SiGe selective removal
5天前
已完结
Cryogenic Etching of SiO₂ in an ICP System Powered by 2 MHz Bias Using C₂F₆/C₄F₈/He Gas Mixtures: Enhanced Mask Preservation and Anisotropy for HARC Applications
5天前
已完结
Recent Advances in the Synthesis of Coumarin Derivatives via Knoevenagel Condensation: A Review
27天前
已完结
Recent Approaches in the Synthesis of 5-Arylidene-2,4-thiazolidinedioneDerivatives Using Knoevenagel Condensation
27天前
已完结
Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation
1个月前
已完结
Effect of O2 dilution and substrate temperature on the etching of SiNx in a C4F6/Ar plasma
1个月前
已完结
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