Lv12
70 积分 2026-05-23 加入
Process stability of SiO2 atomic layer etching in C4F6/Ar chemistry
1天前
求助中
Etching-to-deposition transition in SiO2/Si 3 N 4 using CH x F y ion-based plasma etching: An atomistic study with neural network potentials
1天前
求助中
SiO2 Tapered Etching Employing Magnetron Discharge of Fluorocarbon Gas
26天前
已完结
Low-temperature reactive ion etching and microwave plasma etching of silicon
26天前
已完结
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning
1个月前
已完结
Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model
1个月前
已关闭
Plasma Parameters and Etching Kinetics of Si/SiO2 in Mixtures of Fluorocarbon Gases with Argon and Helium
1个月前
已完结
Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching (PEALE) of SiO2 with high repeatability of cycles in industrial ICP reactor. I. experiment
1个月前
已关闭
Highly selective GaAs/AlGaAs dry etching using HBr/SF6/He
1个月前
已关闭
Mechanism of highly selective etching of SiCN by using NF3/Ar-based plasma
1个月前
已完结
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