| 标题 |
Temperature control system based on Active Disturbance Rejection Control and its parameter optimization in large-sized monolithic silicon epitaxy equipment reactor |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Process Control 作者:J. Suo; Bo Jin; Lingfeng Zhu; Wenjie Shen 出版日期:2025-04-10 |
| 求助人 | |
| 下载 |
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(2025-6-4)