| 标题 |
Atomistic-to-device modeling of thermal transport across amorphous Al2O3/β-Ga2O3 gate-stack interfaces |
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| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Hui Li; Dongyuan Zhai; Hong-Biao Zhou; Lei Shi; Jiwu Lu 出版日期:暂无 |
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(2025-6-4)