硅氧烷
八甲基环四硅氧烷
一氧化碳
氢
补偿(心理学)
半导体
工作(物理)
材料科学
化学
分析化学(期刊)
光电子学
热力学
聚合物
催化作用
复合材料
有机化学
高分子化学
物理
心理学
精神分析
作者
Caroline Schultealbert,Tobias Baur,Tilman Sauerwald,Andreas Schütze
出处
期刊:Tm-technisches Messen
[R. Oldenbourg Verlag]
日期:2023-10-12
卷期号:90 (11): 691-702
被引量:4
标识
DOI:10.1515/teme-2023-0065
摘要
Abstract This work studies poisoning by the cyclic siloxane octamethylcyclotetrasiloxane on a commercially available semiconductor gas sensor in TCO (temperature cycled operation). The data is evaluated using the Sauerwald-Baur model and the DSR method (differential surface reduction). The sensitivity towards several gases (volatile organic compounds, hydrogen and carbon monoxide) is evaluated and compared with a sensor in constant temperature operation mode. The physical and chemical processes on the sensitive layer as well as the resulting selectivity towards hydrogen are discussed. A feature is identified that can be derived from the Sauerwald-Baur model (the differential surface oxidation, DSO) and that quantitatively expresses the sensor condition regarding siloxane poisoning. With the help of this feature, a self-compensation of the sensor signal is demonstrated.
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