覆盖
胶粘剂
模具(集成电路)
薄脆饼
材料科学
计算机科学
光电子学
复合材料
纳米技术
操作系统
图层(电子)
作者
Koen Kennes,Pieter Bex,Lin Ye,Samuel Suhard,Dieter H. Cuypers,Alain Phommahaxay,Gerald Beyer,Eric Beyne
标识
DOI:10.1109/ectc51687.2025.00330
摘要
A critical review of the alignment factors contributing to the final die-to-target wafer overlay in a collective die to wafer bonding flow is presented and discussed in terms of minimal residual bonding errors. The impact of several substrates, such as glass vs silicon wafers, and materials, such as thermoset vs thermoplastics, are evaluated, as well as the used tools (die placement & wafer bonder) and bonding conditions. Although polymer-based glass carriers allow for much more process control in terms of die-height variations and debonding options compared to polymer free silicon carriers, they add negative alignment contributions which, start to dominate with the new generation of die-pick-and place tools and wafer bonders.
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