欧姆接触
材料科学
制作
钻石
肖特基势垒
退火(玻璃)
接触电阻
光电子学
肖特基二极管
二极管
纳米技术
化学气相沉积
复合材料
图层(电子)
替代医学
病理
医学
作者
Sreenath Mylo Valappil,Abdelrahman Zkria,Shinya Ohmagari,Tsuyoshi Yoshitake,Sreenath Mylo Valappil,Abdelrahman Zkria,Shinya Ohmagari,Tsuyoshi Yoshitake
标识
DOI:10.1088/2053-1591/aca31f
摘要
Abstract Diamond-based Schottky barrier diodes (SBDs) are involved in many technological applications. In a conventional SBD fabrication process that involves interface carbide forming ohmic contacts, a post-annealing step is necessary for ohmic contacts to achieve their operational efficiency. However, this step deteriorates the essential oxygen coverage at the diamond surface which in turn affects SBDs uniformity. So, an additional oxygen termination step is necessary prior to Schottky metal deposition. In this study, a non-conventional fabrication method is introduced using corrosion-resistant nanocarbon ohmic contacts fabricated by coaxial arc plasma deposition. As a result, The SBD parameters including ideality factors and barrier heights exhibited high uniformity with a very small standard deviation for the proposed fabrication process flow when compared with process flow including a post-annealing step. Furthermore, the contact behavior of nanocarbon ohmic electrodes is investigated on a heavily boron-doped diamond film using circular transmission line model theory and a specific contact resistance of ∼10 −5 Ωcm 2 is obtained, suggesting the practical application of nanocarbon ohmic contacts for diamond-based electronic devices.
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