材料科学
响应度
光电探测器
光电子学
紫外线
光学
暗电流
分子束外延
半导体
外延
纳米技术
物理
图层(电子)
作者
Bi-Cheng Wang,Ziying Tang,Zheng Huying,Lisheng Wang,Yaqi Wang,Wang Runchen,Qiu Zhiren,Hai Zhu
标识
DOI:10.1088/1674-1056/acd3e4
摘要
We successfully fabricate a high performance β -phase (In 0.09 Ga 0.91 ) 2 O 3 single-crystalline film deep ultraviolet (DUV) solar-blind photodetector. The 2-inches high crystalline quality film is hetero-grown on the sapphire substrates using the plasma-assisted molecular beam epitaxy (PA-MBE). The smooth InGaO single crystalline film is used to construct the solar-blind DUV detector, which utilized an interdigitated Ti/Au electrode with a metal–semiconductor–metal structure. The device exhibits a low dark current of 40 pA (0 V), while its UV photon responsivity exceeds 450 A/W (50 V) at the peak wavelength of 232 nm with illumination intensity of 0.21 mW/cm 2 and the UV/VIS rejection ratio ( R 232 nm / R 380 nm ) exceeds 4 × 10 4 . Furthermore, the devices demonstrate ultrafast transient characteristics for DUV signals, with fast-rising and fast-falling times of 80 ns and 420 ns, respectively. This excellent temporal dynamic behavior can be attributed to indium doping can adjust the electronic structure of Ga 2 O 3 alloys to enhance the performance of InGaO solar-blind detectors. Additionally, a two-dimensional DUV scanning image is captured using the InGaO photodetector as a sensor in an imaging system. Our results pave the way for future applications of two-dimensional array DUV photodetectors based on the large-scale InGaO heteroepitaxially grown alloy wide bandgap semiconductor films.
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