The differences between the hydrogenation by means of photon-injection and electron-injection for N-type tunnel oxide passivated contacts solar cells

Tunnel Oxide Passivated Contact (TOPCon) solar cells have received widespread attention in recent years, especially in improving conversion efficiency. This paper investigated the impact of hydrogenation technology using photon-injection (HPI) and electron-injection (HEI) processes on TOPCon solar cells, highlighting the higher improvement effect and broader application scope of HPI compared to HEI. In TOPCon cells, several methods are available to prepare the tunneling oxide layer, such as plasma oxidation (PO) and indirect thermal oxidation (TO). The research results indicated that significant improvement differences could be observed when utilizing the HEI treatment for TOPCon solar cells prepared by PO and TO methods, with values of 0.133%abs. and −0.039%abs., respectively. Meanwhile, HPI treatment induced a more significant efficiency improvement for these two types of cells, and the increase in efficiency is 0.247%abs. and 0.244%abs., respectively. The experimental results demonstrated that the passivation effect for TOPCon solar cells prepared by PO and TO methods remained almost the same under the HPI treatment, and the improvement effect is less dependent on the tunnel oxidation technique used. Thus, the different passivation effects between HPI and HEI were further investigated, and the reason for the difference was attributed to the charge states and concentrations of hydrogen and non-equilibrium carriers during the hydrogenation. The results provided an improved scheme for enhancing the efficiency of TOPCon solar cells, shedding light on the role of HPI and HEI in the passivation process. This work brings further insights to TOPCon solar cells.