光致发光
外延
材料科学
基面
光谱学
光学显微镜
波长
显微镜
光电子学
晶体缺陷
分辨率(逻辑)
位错
发射光谱
光学
结晶学
化学
谱线
扫描电子显微镜
纳米技术
物理
复合材料
图层(电子)
量子力学
天文
人工智能
计算机科学
作者
Isaho Kamata,Xuan Zhang,Hidekazu Tsuchida
摘要
Frank-type defects on the basal plane in thick 4H–SiC epitaxial layers have been characterized by photoluminescence (PL) spectroscopy and a PL imaging microscopy. The PL emission wavelength of the three kinds of Frank-type defects were determined at ∼424, 457, and 488 nm at room temperature, respectively. The high-resolution PL imaging of the defects was obtained, and the PL emission at the Frank partial dislocations was confirmed in the near infrared region (>700 nm). Correspondence between the optical properties and the microscopic structures of the defects was clarified.
科研通智能强力驱动
Strongly Powered by AbleSci AI