锡
位错
劈理(地质)
材料科学
表征(材料科学)
结晶学
电阻率和电导率
带隙
电导率
光电子学
化学
纳米技术
冶金
物理化学
复合材料
工程类
断裂(地质)
电气工程
作者
V. P. Bhatt,K. Gireesan,G. R. Pandya
标识
DOI:10.1016/0022-0248(89)90063-8
摘要
This paper reports the growth of tin monoselenide (SnSe) and tin diselenide (SnSe2) single crystals by Bridgman-Stockbarger technique. Different rates of lowering ranging from 4 to 10 mm/h were used and it has been observed that reasonable quality crystals (dislocation density 104 -105 cm-2 could be grown at a rate of 7mm/h for SnSe and 4mm/h for SnSe2. A new dislocation etchant capable of revealing dislocations intersecting the (001) cleavage plane has been reported in the case of SnSe and electrical conductivity and optical band gap of both crystals are compared with previous reports.
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