X射线光电子能谱
结合能
化学状态
激发态
化学位移
电子光谱学
化学
俄歇电子能谱
聚合
硅
结晶学
分析化学(期刊)
材料科学
物理化学
原子物理学
核磁共振
聚合物
物理
有机化学
核物理学
作者
Kiyoshi Okada,Yoshikazu Kameshima,Atsuo Yasumori
标识
DOI:10.1111/j.1151-2916.1998.tb02579.x
摘要
The binding energy of Si 2 p electrons and the kinetic energy of the Si(KLL) X‐ray‐excited state were measured by using X‐ray photoelectron spectroscopy (XPS) and X‐ray Auger electron spectroscopy (XAES), respectively, for silicates with SiO 4 tetrahedra of various polymerization types. The resulting Si 2 p XPS binding energies varied from 101.3 eV in merwinite (monomeric structure) to 103.4 eV in quartz and cristobalite (three‐dimensional framework structure). A clear chemical‐shift relation was observed, relating the polymerization structures of SiO 4 tetrahedra to the plots of their Si 2 p XPS binding energy versus the kinetic energy of their Si(KLL) XAES spectra. Thus, the structural state of the surface silicates in various substances can be deduced from this chemical‐shift relationship.
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