Fabrication of fused silica microstructure based on the femtosecond laser

Ultrafast pulsed lasers can facilitate the manufacturing of complex microstructures. However, previous laser processing applications have focused on static components. Consequently, the application of laser processing in high-performance resonant structures has received less attention. Ultrafast lasers provide a unique opportunity for realizing the structure detachment from the planar fused silica substrates. However, the processing quality has a considerable influence on resonant structures. High-quality and high-efficiency laser manufacturing methods are critical for processing resonant structures. In this study, we demonstrate a method for processing fused silica microstructures based on the femtosecond laser. We studied the influence of different laser parameters on the processing quality and determined the optimal laser parameters suitable for the microstructure. The resonant structure of the butterfly gyroscope was used to verify the manufacturing method. A steepness of 86.6° and a roughness of 653.2 nm were achieved by using the optimized laser parameters. These are expected to provide technical support for the development of high-performance fused silica dynamic devices in the future.