纳米电子学
材料科学
纳米技术
六方氮化硼
工程物理
半导体
电介质
氮化硼
计算机科学
光电子学
石墨烯
工程类
作者
Yu. Yu. Illarionov,Theresia Knobloch,Markus Jech,Mario Lanza,Deji Akinwande,M. I. Vexler,Thomas Mueller,Max C. Lemme,Gianluca Fiori,Frank Schwierz,Tibor Grasser
标识
DOI:10.1038/s41467-020-16640-8
摘要
Abstract Nanoelectronic devices based on 2D materials are far from delivering their full theoretical performance potential due to the lack of scalable insulators. Amorphous oxides that work well in silicon technology have ill-defined interfaces with 2D materials and numerous defects, while 2D hexagonal boron nitride does not meet required dielectric specifications. The list of suitable alternative insulators is currently very limited. Thus, a radically different mindset with respect to suitable insulators for 2D technologies may be required. We review possible solution scenarios like the creation of clean interfaces, production of native oxides from 2D semiconductors and more intensive studies on crystalline insulators.
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