Optical properties and annealing effects of planar waveguides on fluoride lead silicate glass formed by proton and helium-ion implantation

退火(玻璃) 材料科学 离子 氟化物 平面的 离子注入 质子 硅酸盐 硅酸盐玻璃 光电子学 光学 原子物理学 无机化学 化学 复合材料 物理 核物理学 计算机图形学(图像) 计算机科学 有机化学
作者
Jie Zhang,Jingyi Chen,Shuo-Qi Lin,Ruilin Zheng,Liaolin Zhang,Chun‐Xiao Liu
出处
期刊:Optical Engineering [SPIE]
卷期号:60 (02) 被引量:1
标识
DOI:10.1117/1.oe.60.2.027105
摘要

The optical planar waveguides were fabricated by proton implantation with an energy of 400 keV and a dose of 8 × 1016 ions / cm2 or 400-keV helium-ion implantation with a fluence of 6 × 1016 ions / cm2 in the fluoride lead silicate glass. The morphologies were studied by a Zeiss microscope to estimate the thickness of the waveguides. The annealing effects on the fluoride lead silicate glass waveguides were investigated by 60 min annealing cycles at different temperatures ranging from 260°C to 310°C in air atmosphere. The dark-mode spectra and corresponding effective refractive indices before and after the thermal treatments were measured by the prism coupling system. The Stopping and Range of Ions in Matter 2013 code was used to simulate the irradiation process and calculate the energy losses. The refractive index distributions were reconstructed by the reflectivity calculation method. The near-field light intensity profiles of the proton and helium-ion implanted fluoride lead silicate glass waveguides were measured by the end-face coupling system. The comparison of optical properties between the proton-implanted waveguide and helium-ion implanted one was carried out. The experimental results show that the helium-ion implantation is more suitable for the fabrication of the fluoride lead silicate glass optical waveguides and the He + -implanted waveguide has better optical propagation performances.
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