Analysis of oxygen-based species introduced during plasma assisted reactive processing of a-IGZO films

Abstract Thermal desorption spectroscopy using stable isotopes of 18 O 2 and D 2 was employed to investigate the incorporation and behavior of oxygen-based species in a-IGZO films during plasma assisted processing. Specifically, the behavior of oxygen introduced during deposition with an Ar- 18 O 2 plasma was assessed. The data show that the oxygen amount incorporated in these films during deposition was greatly reduced by a post-deposition plasma treatment. The OD radicals introduced into a-IGZO films deposited with Ar- 16 O 2 during a post-treatment with an Ar + D 2 + O 2 mixture was also examined. The results indicate that −OD groups in the films were strongly bonded to the metal atoms.