材料科学
薄膜
剥脱关节
外延
范德瓦尔斯力
溅射
溶解
纳米技术
复合材料
石墨烯
化学工程
图层(电子)
分子
工程类
有机化学
化学
作者
Sang-Ho Han,Sangho Lee,Duk Han Ko,Mengjie Zhang,Jeehwan Kim,Caroline A. Ross,Dong Hun Kim
标识
DOI:10.1002/adfm.202306909
摘要
Abstract Integration of functional thin films onto flexible substrates is driven by the need to improve the performance and durability of flexible electronic devices. A van der Waals epitaxy technology that accomplishes the transfer of oxide or metal thin films via exfoliation or dissolution of sacrificial α‐MoO 3 layers produced by sputtering is presented. The α‐MoO 3 thin films, consisting of weakly bonded 2D layers, grow epitaxially on SrTiO 3 (001) substrates, exhibiting mosaic domains rotated by 90°. Metallic Au films grown on the α‐MoO 3 are transferred by mechanical exfoliation or by dissolving the α‐MoO 3 in water at 45 °C. Spinel‐structured CoFe 2 O 4 thin films grown on α‐MoO 3 layers are easily transferred to flexible substrates via mechanical exfoliation, and the magnetic anisotropy of the transferred CoFe 2 O 4 films is modulated by bending.
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