Michael J. Uren,Trevor Martin,J.C.H. Birbeck,R.S. Balmer,B.T. Hughes,J.J. Guest,A.J. Hydes,H.A. Willis,T. Jelfs
标识
DOI:10.1109/edmo.2000.919032
摘要
Self-heating in GaN/AlGaN HFETs fabricated on sapphire and silicon carbide substrates has been compared. Pulse I-V measurements showed that the thermal resistance of devices on SiC substrates was about 5 lower than for sapphire. This demonstrates the need for SiC substrates to dissipate the enormous power density in these devices.