Rectification at n-n GaAs:(Ga,Al)As heterojunctions
作者
A. Chandra,L.F. Eastman
出处
期刊:Electronics Letters [Institution of Engineering and Technology] 日期:1979-02-01卷期号:15 (3): 90-91被引量:30
标识
DOI:10.1049/el:19790066
摘要
n-n Ga0.7Al0.3As: GaAs heterojunction structures have been grown by l.p.e., with 1 × 1015 cm-3 net carriers in the ternary. N/W profiling across the heterojunction shows an accumulation region on the GaAs side and a depletion region on the (Ga, Al)As side. I/V characteristics at room temperature show significant rectification.