高电子迁移率晶体管
单片微波集成电路
放大器
电气工程
射频功率放大器
无线电频率
材料科学
微波食品加热
晶体管
光电子学
砷化镓
工程类
电压
电信
CMOS芯片
作者
Yeong-Chang Chou,R. Lai,Thomas Block,Arvind Kumar Sharma,Qiang Kan,D. Leung,D. Eng,A.K. Oki
标识
DOI:10.1109/tmtt.2005.858384
摘要
This paper describes RF-driven gate current effects on the dc/RF performance of 0.15-/spl mu/m (gate length) 2-mil (substrate thickness) GaAs pseudomorphic high-electron mobility transistor (pHEMT) monolithic microwave integrated circuit power amplifiers (PAs). High gate current is generated in PAs under RF drive at room temperature. A long-term lifetest of PAs with various gate currents induced by RF drive was performed to investigate the effect of RF-driven gate current on dc/RF performance in GaAs pHEMT PAs. Accordingly, an empirical model was developed to predict the dc/RF performance of V-band PA modules by the end of life (EOL). This information is crucial for system engineers in order to budget sufficient output power so that the system can still maintain performance capability by EOL.
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