Additive-Free All-Carbon Composite: A Two-Photon Material System for Nanopatterning of Fluorescent Sub-Wavelength Structures

The major bottleneck in fabrication of engineered 3D nanostructures is the choice of materials. Adding functionality to these nanostructures is a daunting task. In order to mitigate these issues, we report a two-photon patternable all carbon material system which can be used to fabricate fluorescent 3D micro/nanostructures using two-photon lithography, with subwavelength resolution. The synthesized material system eliminates the need to use conventional two-photon absorbing materials such as two-photon dyes or two-photon initiators. We have used two different trifunctional acrylate monomers and carbon dots, synthesized hydrothermally from a polyphenolic precursor, to formulate a two-photon processable resin. Upon two-photon excitation, photogenerated electrons in the excited states of the carbon dots facilitate the free radical formation at the surface of the carbon dots. These radicals, upon interaction with vinyl moieties, enable cross-linking of acrylate monomers. Free-radical induced two-photon polymerization of acrylate monomers without any conventional proprietary two-photon absorbing materials was accomplished at an ultrafine subwavelength resolution of 250 nm using 800 nm laser excitation. The effect of critical parameters such as average laser power, carbon dot concentration, and radiation exposure were determined for the fabrication of one-, two-, and three-dimensional functional nanostructures, applicable in a range of domains where fluorescence and toxicity are of the utmost importance. A fabrication speed as high as 100 mm/s was achieved. The ability to fabricate functional 3D micro-/nanostructures is anticipated to instigate a paradigm shift in various areas such as metamaterials, energy storage, drug delivery, and optoelectronics to name a few.