肖特基二极管
沟槽
碳化硅
肖特基势垒
材料科学
二极管
光电子学
金属半导体结
MOSFET
晶体管
电子工程
电气工程
电压
纳米技术
工程类
图层(电子)
冶金
作者
Xuan Li,Xing Tong,Alex Q. Huang,Hong Tao,Kun Zhou,Yifan Jiang,Junning Jiang,Xiaochuan Deng,Xu She,Bo Zhang,Yourun Zhang,Qi Tian
标识
DOI:10.1109/ted.2017.2767904
摘要
A silicon carbide (SiC) trench MOSFET (TMOS) with integrated three-level protection (TLP) Schottky barrier diode (SBD), named ITS-TMOS, is proposed and investigated by simulation. The device features the integrated TLP-SBD that remarkably improves body diode characteristics while guarantees excellent fundamental performance of TMOS. In the blocking state, the P-base region, the trench gate, and the P+ shield at the trench bottom serve as the TLP of the Schottky contact. Each protection assists in depleting the drift region beneath Schottky contact. Benefiting from the self-assembled TLP, the leakage current of the integrated body diode of the ITS-TMOS is significantly reduced. Moreover, the reverse turnon voltage (V ON ) and the gate charge (Q g ) of the ITS-TMOS are 65% and 18% lower than those of the conventional TMOS, respectively. The improved overall performances make the SiC ITS-TMOS a competitive candidate for high-efficiency and high power density applications.
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