Memristor memory element based on ZnO thin film structures

The memristor element for random access memory (resistance random access memory - ReRAM) was developed and investigated. The developed structure consists of a Schottky diode (1D) based on Pt/ZnO:Ga/ZnO/Pt heterostructure and a memristor (1R) based on Pt/ZnO:Ga/ZnO/ZnO:Li/Pt heterostructure. Thus the unipolar memristor memory element of 1D1R type was obtained. The heterostructures were produced by the electron-beam vacuum deposition method. The laboratory samples of the memory elements were prepared and their characteristics were studied. The proposed device has a high stability and withstands 1000 switching cycles without derating.