Synthesis and characterization of Ti-WO3 films for electrochromic applications

In this work, tungsten oxide thin films with titanium dopant were deposited at various temperatures of substrate and oxygen partial pressures on silicon wafer and indium doped tin oxide glasses using reactive dc-magnetron sputtering. The main objective of the study is to investigate in detail and to discuss the effect of titanium and deposition parameters on morphological and electrochromic studies of the films. With the alteration of deposition parameters, the morphology changed from granular to coarse with coagulation of grains, and the titanium has significant impact in increasing the grain size. The titanium films incorporated, which are analyzed by an energy dispersive spectroscopy. The needle-like grains with columnar topography was observed, and having some voids over the surface analyzed with atomic force microscopy. The films exhibited excellent electrochromic properties. The films coloration efficiency was altered between 31.8 cm2/C to 101.70 cm2/C.