光学
栅栏
绝缘体上的硅
波导管
材料科学
光电子学
插入损耗
极化(电化学)
硅
折射率
物理
物理化学
化学
作者
Sailong Wu,Simei Mao,Lidan Zhou,Lin Liu,Yujie Chen,Xin Mu,Li-Rong Lilly Cheng,Zhenmin Chen,Xin Tu,H. Y. Fu
出处
期刊:Optics Express
[Optica Publishing Group]
日期:2020-08-17
卷期号:28 (19): 27268-27268
被引量:35
摘要
In this work, we proposed and experimentally demonstrated a compact and low polarization-dependent silicon waveguide crossing based on subwavelength grating multimode interference couplers. The subwavelength grating structure decreases the effective refractive index difference and shrinks the device footprint. Our designed device is fabricated on the 220-nm SOI platform and performs well. The measured crossing is characterized with low insertion loss (< 1 dB), low polarization-dependence loss (< 0.6 dB), and low crosstalk (< -35 dB) for both TE and TM polarizations with a compact footprint of 12.5 μm × 12.5 μm.
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