高电子迁移率晶体管
光电子学
外延
发光二极管
材料科学
二极管
晶体管
蚀刻(微加工)
氮化镓
宽禁带半导体
降级(电信)
偏压
电压
电子工程
纳米技术
电气工程
图层(电子)
工程类
作者
Zhaojun Liu,Jun Ma,Tongde Huang,Chao Liu,Kei May Lau
摘要
In this Letter, we report selective epitaxial growth of monolithically integrated GaN-based light emitting diodes (LEDs) with AlGaN/GaN high-electron-mobility transistor (HEMT) drivers. A comparison of two integration schemes, selective epitaxial removal (SER), and selective epitaxial growth (SEG) was made. We found the SER resulted in serious degradation of the underlying LEDs in a HEMT-on-LED structure due to damage of the p-GaN surface. The problem was circumvented using the SEG that avoided plasma etching and minimized device degradation. The integrated HEMT-LEDs by SEG exhibited comparable characteristics as unintegrated devices and emitted modulated blue light by gate biasing.
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