Control of Projection Uniformity and Fidelity in Spatial Light Modulator-Based Holography

This work describes the steps necessary for a holographic pattern projection of high quality with a phase-only Liquid crystal on silicon spatial light modulator (LCoS-SLM). The aim is high-throughput optical lithography on nonplanar surfaces. Aspects of diffractive optical element calculation as well as aspects of aberration compensation are needed to increase the uniformity and fidelity of intricate patterns.