Study on new type LIGA mask fabrication technique

The fabrication of LIGA masks is a critical and challenging process in LIGA technique. As inductively coupled plasma (ICP) deepetching appears to be the most suitable source for deep silicon etching, we fabricated a new type LIGA mask using this technique. In comparison with other types of LIGA masks, the mask we fabricated has the advantages of its low cost and its simple fabrication process. Desired microstructures have also been fabricated using this new type LIGA mask in LIGA technique.