CMOS active pixel image sensors fabricated using a 1.8 V, 0.25 μm CMOS technology
作者
Hon-Sum Weng,R.T. Chang,Emmanuel F. Crabbé,Paul D. Agnello
出处
期刊:Technical digest [Institute of Electrical and Electronics Engineers] 日期:2002-12-24卷期号:: 915-918被引量:4
标识
DOI:10.1109/iedm.1996.554128
摘要
This paper reports the experimental results of the first CMOS active pixel image sensors fabricated using a high-performance 1.8 V, 0.25 /spl mu/m CMOS logic technology. No process modifications were made to the CMOS logic technology so that the impact of device scaling on the image sensing performance can be studied. This paper highlights the device and process design considerations required to enable CMOS as an image sensor technology.