阳极
水溶液
原子层沉积
电极
无定形固体
图层(电子)
钾
材料科学
涂层
薄膜
化学
化学工程
分析化学(期刊)
纳米技术
复合材料
结晶学
冶金
物理化学
工程类
色谱法
作者
Nicholas David Schuppert,Santanu Mukherjee,Alex Bates,Eun-Jin Son,Moon Jong Choi,Sam Park
标识
DOI:10.1016/j.jpowsour.2016.03.064
摘要
Abstract The effect of thin film TiO 2 atomic layer deposition (ALD) coating on induced material strain is investigated utilizing ex-situ XRD analysis of a layered-structured α-MoO 3 anode. Electrode material lattice expansion is quantified by the examination of ex-situ XRD peak shift, and is performed on both potassiated and potassium-deficient electrodes. Observations of TiO 2 ALD coated electrodes reveal significant strain reduction of the electrode material resulting in an increase in the life-cycle of the aqueous cells. The presence of the 10 nm thick amorphous TiO 2 ALD layer is found to withhold considerable lattice strain at the thin-film/electrode interface, reducing lattice deformation by 68.2% and exhibits a capacity retention 2.5 times greater than that of the pristine electrode after 20 cycles of operation. The influence of the ALD coating on charge/discharge kinetics and cell capacity is also examined.
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