聚苯乙烯
高功率脉冲磁控溅射
材料科学
溅射沉积
溅射
腔磁控管
沉积(地质)
光电子学
化学工程
薄膜
复合材料
纳米技术
聚合物
生物
沉积物
工程类
古生物学
作者
Yusuf Bulut,Benedikt Sochor,Kristian A. Reck,Bernhard Schummer,Alexander Meinhardt,Jonas Drewes,Suzhe Liang,Tianfu Guan,Arno Jeromin,Andreas Stierle,Thomas F. Keller,Thomas Strunskus,Franz Faupel,Peter Müller‐Buschbaum,Stephan V. Roth
出处
期刊:Langmuir
[American Chemical Society]
日期:2024-10-15
卷期号:40 (43): 22591-22601
被引量:4
标识
DOI:10.1021/acs.langmuir.4c02344
摘要
Fabricating thin metal layers and particularly observing their formation process in situ is of fundamental interest to tailor the quality of such a layer on polymers for organic electronics. In particular, the process of high power impulse magnetron sputtering (HiPIMS) for establishing thin metal layers has sparsely been explored in situ. Hence, in this study, we investigate the growth of thin gold (Au) layers with HiPIMS and compare their growth with thin Au layers prepared by conventional direct current magnetron sputtering (dcMS). Au was chosen because it is an inert noble metal and has a high scattering length density. This allows us to track the growing nanostructures via grazing incidence scattering. In particular, Au deposition on the polymer polystyrene (PS) with the respective structural analogues poly-4-vinlypyridine (P4VP) and polystyrene sulfonic acid (PSS) is studied. Additionally, the nanostructured layers on these different polymer films are further probed by field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), X-ray reflectometry (XRR), and four-point probe measurements. We report that HiPIMS leads to smaller island-to-island distances throughout the whole sputter process. Moreover, an increased cluster density and an earlier percolation threshold are achieved compared to dcMS. Additionally, in the early stage, we observe a significant increase in coverage by HiPIMS, which is favorable for the improvement of the polymer-metal interface.
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