电致发光
材料科学
光电子学
异质结
发光二极管
图层(电子)
宽禁带半导体
二极管
发射强度
光致发光
纳米技术
作者
Jingbi You,X. W. Zhang,S. G. Zhang,Jiapeng Wang,Z. G. Yin,Hairen Tan,Wenjun Zhang,Paul K. Chu,B. Cui,A. M. Wowchak,A. M. Dabiran,P. P. Chow
摘要
n-ZnO/p-GaN heterojunction light-emitting diodes with and without a sandwiched AlN layer were fabricated. The electroluminescence (EL) spectrum acquired from the n-ZnO/p-GaN displays broad emission at 650 nm originating from ZnO and weak emission at 440 nm from GaN, whereas the n-ZnO/AlN/p-GaN exhibits strong violet emission at 405 nm from ZnO without GaN emission. The EL intensity is greatly enhanced by inserting a thin AlN intermediate layer and it can be attributed to the suppressed formation of the GaOx interfacial layer and confinement effect rendered by the AlN potential barrier layer.
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