Effect of Sputtering Parameter on Microstructure and Infrared Reflectivity of Mo Films

Mo films were deposited on the substrates of stainless steel by DC magnetron sputtering method.Mo films were characterized by X-ray diffraction(XRD),scanning electron microscopy(SEM),and FT-IR Spectrometer.The influence of sputtering pressure and sputtering power on the microstructure,morphology and the infrared reflectivity were studied.