The Attenuated Phase-Shifting Mask for KrF Excimer Laser Photolithography

The basic principle for improving photolithography resolution of phase-shifting mask is discussed and a new method for manufacturing attenuated phase-shifting mask with photoresist shifter is proposed.Experimental research in carried out by means of projection photolithography experimental system with KrF excimer laser designed and built by ourselves.The experimental results are given and a comparison with the traditional photolithography methods is carried out.