微透镜
材料科学
通量
蚀刻(微加工)
焦距
光学
飞秒
激光器
表面粗糙度
制作
纳米光刻
钻石
光电子学
表面光洁度
反应离子刻蚀
各向同性腐蚀
纳米技术
镜头(地质)
图层(电子)
复合材料
物理
病理
医学
替代医学
作者
Xueqing Liu,Lei Yu,Shuangning Yang,Qi‐Dai Chen,Lei Wang,Saulius Juodkazis,Hong‐Bo Sun
标识
DOI:10.1002/lpor.201800272
摘要
Abstract For the simple and versatile fabrication of nanosmooth finished microlens arrays on hard materials, an approach combining femtosecond laser modification with subsequent ion beam etching is demonstrated. This method is based on the dependence of the plasma etching rate on the laser fluence used to modify the surface. The fabricated microlenses exhibit a low surface roughness of approximately 2.5 nm, due to the high precision of the plasma etching and benefit from the smooth interface between the laser‐modified and pristine subsurface regions. Microlenses with focal lengths ranging from 60 to 100 µm are realized by controlling the laser fluence, exposure dose, and etching time. Uniform square and hexagonal microlens arrays are fabricated on both hard and ultrahard materials and glasses (fused silica, GaAs, SiC, diamond) by the same process and deliver high‐quality focusing and imaging.
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