二次离子质谱
霍尔效应
材料科学
薄膜
铟
电阻率和电导率
分析化学(期刊)
电导率
氮气
大气温度范围
宽禁带半导体
光电子学
电子迁移率
纳米技术
化学
硅
电气工程
物理化学
气象学
有机化学
工程类
物理
色谱法
作者
L. L. Chen,Jianguo Lü,Z. Z. Ye,Yuan‐Min Lin,Binghui Zhao,Yingying Ye,J. Li,Li Zhu
摘要
p -type ZnO thin films have been realized by the In–N codoping method. Secondary ion mass spectroscopy revealed that the nitrogen incorporation was enhanced by the presence of indium in ZnO. The as-grown In–N codoped ZnO film shows acceptable p-type behavior at room temperature with high film quality. A conversion from p-type conduction to n type in a range of temperature was confirmed by Hall effect measurement. The lowest reliable room-temperature resistivity was found to be 3.12Ωcm with a carrier concentration of 2.04×1018cm−3 and a Hall mobility of 0.979cm2V−1S−1. The p-type behavior is stable.
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