污染
平版印刷术
镜头(地质)
传输(电信)
环境科学
净化
过程(计算)
工艺工程
材料科学
基质(水族馆)
计算机科学
纳米技术
废物管理
光学
工程类
电信
光电子学
物理
海洋学
操作系统
生物
地质学
生态学
作者
Andrew J. Dallas,Debbie Arends,Kristen Fischer,Jon Joriman,Kristine Graham,Richard Ringold
摘要
It has been well documented that DUV lithographic processes are sensitive to airborne contamination such as ammonia and n- methyl-2-pyrrolidone (NMP). Chemical filtration technologies have aided in minimizing the problems associated with these contaminants in the photolithographic process. As the demand for smaller features increases, so will the need to operate within even cleaner environments than are available today. One such area where airborne contamination has proven to be of significant concern, is within the lensing system of the tool. With decreasing feature size, the lithographic process has proven to be more sensitive to contamination of the lens itself, and within the environment surrounding the lens. Condensation on the lens (hazing) and the presence of contamination between the lens and substrate can result in poor optical transmission. To minimize these problems, a purge gas is typically employed. Even though high purity gases are used, contamination within the gas still is an issue. This work describes our efforts directed at understanding the purge gas and lens environments. In addition, we will address our efforts that have focused on the development of chemical filters that provide environments for optimized optical transmission in lithographic applications.
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