Patterning Complex Line Motifs in Thin Films Using Immersion‐Controlled Reaction‐Diffusion

Abstract The discovery of self‐organization principles that enable scalable routes toward complex functional materials has proven to be a persistent challenge. Here, reaction‐diffusion driven, immersion‐controlled patterning (R‐DIP) is introduced, a self‐organization strategy using immersion‐controlled reaction‐diffusion for targeted line patterning in thin films. By modulating immersion speeds, the movement of a reaction‐diffusion front over gel films is controlled, which induces precipitation of highly uniform lines at the reaction front. A balance between the immersion speed and diffusion provides both hands‐on tunability of the line spacing () as well as error‐correction against defects. This immersion‐driven patterning strategy is widely applicable, which is demonstrated by producing line patterns of silver/silver oxide nanoparticles, silver chromate, silver dichromate, and lead carbonate. Through combinatorial stacking of different line patterns, hybrid materials with multi‐dimensional patterns such as square‐, diamond‐, rectangle‐, and triangle‐shaped motifs are fabricated. The functionality potential and scalability is demonstrated by producing both wafer‐scale diffraction gratings with user‐defined features as well as an opto‐mechanical sensor based on Moiré patterning.