材料科学
电磁屏蔽
电磁干扰
电磁干扰
石墨烯
复合材料
化学气相沉积
电阻率和电导率
光电子学
纳米技术
电子工程
电气工程
工程类
作者
Zehui Wang,Honglie Shen,Kewen Luo,Weibiao Mao,Yajun Xu,Jingzhe Zhang,Jiawei Ge,Yufang Li,Yan Yang,Tianru Wu
标识
DOI:10.1016/j.mtcomm.2022.104608
摘要
Due to the development of high-frequency electronic devices, electromagnetic pollution has attracted global attention. Electromagnetic interference (EMI) shielding materials with low thickness, improved EMI shielding performance and lightweight are highly required for protecting the devices. Metal foams (MFs) and carbon-related materials have been successfully applied in EMI shielding. Herein, by utilizing the plasma-enhanced chemical vapor deposition (PECVD) method, high-quality vertical graphene nanowalls (VGNs) were prepared on Cu foam (CF) and Ni foam (NF) substrates. The combination of porous VGNs and MFs significantly improved their electrical conductivity, thus their EMI shielding performance was enhanced. The electrical conductivity of the VGNs/CF films could reach 4.81 × 106 S·m-1, increased by 15.3 % compared with the pristine CF films. At a frequency range of 8.2–12.4 GHz, the EMI shielding effectiveness values of VGNs/CF films with a thickness of ∼ 120 µm could reach 81.7 dB, increased by 25.9% compared with the pristine CF films. The VGNs/MF composite films with preferable EMI shielding effectiveness provide a new possibility for developing high-performance EMI shielding materials.
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