材料科学
凝聚态物理
铁电性
居里温度
薄膜
极化(电化学)
泡利不相容原理
纳米技术
光电子学
铁磁性
物理
电介质
化学
物理化学
作者
Kai Liu,Jinlian Lu,Silvia Picozzi,L. Bellaïche,Hongjun Xiang
标识
DOI:10.1103/physrevlett.121.027601
摘要
Previous studies showed that, as ferroelectric films become thinner, their Curie temperature (${T}_{c}$) and polarization below ${T}_{c}$ both typically decrease. In contrast, a recent experiment [Chang et al., Science 353, 274 (2016)] observed that atomic-thick SnTe films have a higher ${T}_{c}$ than their bulk counterpart, which was attributed to extrinsic effects. We find, using first-principles calculations, that the 0-K energy barrier for the polarization switching (which is a quantity directly related to ${T}_{c}$) is higher in most investigated defect-free SnTe ultrathin films than that in bulk SnTe, and that the 5-unit-cell (UC) SnTe thin film has the largest energy barrier as a result of an interplay between hybridization interactions and Pauli repulsions. Further simulations, employing a presently developed effective Hamiltonian, confirm that freestanding, defect-free SnTe thin films have a higher ${T}_{c}$ than bulk SnTe, except for the 1-UC case. Our work, therefore, demonstrates the possibility to intrinsically enhance ferroelectricity of ultrathin films by reducing their thickness.
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