Intrinsic Origin of Enhancement of Ferroelectricity in SnTe Ultrathin Films

材料科学 凝聚态物理 铁电性 居里温度 薄膜 极化(电化学) 泡利不相容原理 纳米技术 光电子学 铁磁性 物理 电介质 化学 物理化学
作者
Kai Liu,Jinlian Lu,Silvia Picozzi,L. Bellaïche,Hongjun Xiang
出处
期刊:Physical Review Letters [American Physical Society]
卷期号:121 (2) 被引量:73
标识
DOI:10.1103/physrevlett.121.027601
摘要

Previous studies showed that, as ferroelectric films become thinner, their Curie temperature (${T}_{c}$) and polarization below ${T}_{c}$ both typically decrease. In contrast, a recent experiment [Chang et al., Science 353, 274 (2016)] observed that atomic-thick SnTe films have a higher ${T}_{c}$ than their bulk counterpart, which was attributed to extrinsic effects. We find, using first-principles calculations, that the 0-K energy barrier for the polarization switching (which is a quantity directly related to ${T}_{c}$) is higher in most investigated defect-free SnTe ultrathin films than that in bulk SnTe, and that the 5-unit-cell (UC) SnTe thin film has the largest energy barrier as a result of an interplay between hybridization interactions and Pauli repulsions. Further simulations, employing a presently developed effective Hamiltonian, confirm that freestanding, defect-free SnTe thin films have a higher ${T}_{c}$ than bulk SnTe, except for the 1-UC case. Our work, therefore, demonstrates the possibility to intrinsically enhance ferroelectricity of ultrathin films by reducing their thickness.

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