平版印刷术
毫米
光学
材料科学
紫外线
波长
可见光谱
制作
镜头(地质)
纳米球光刻
光电子学
纳米技术
物理
医学
病理
替代医学
作者
Joon‐Suh Park,Soon Wei Daniel Lim,Arman Amirzhan,Hyukmo Kang,Karlene Karrfalt,Daewook Kim,Joel D. Leger,Augustine Urbas,Marcus Ossiander,Zhaoyi Li,Federico Capasso
出处
期刊:ACS Nano
[American Chemical Society]
日期:2024-01-17
卷期号:18 (4): 3187-3198
被引量:108
标识
DOI:10.1021/acsnano.3c09462
摘要
/1.5, NA = 0.32) using deep-ultraviolet (DUV) projection lithography. Our work overcomes the exposure area constraints of lithography tools and demonstrates that large metasurfaces are commercially feasible. Additionally, we investigate the impact of various fabrication errors on the imaging quality of the metalens, several of which are specific to such large area metasurfaces. We demonstrate direct astronomical imaging of the Sun, the Moon, and emission nebulae at visible wavelengths and validate the robustness of such metasurfaces under extreme environmental thermal swings for space applications.
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