The unfolding road from dust to trust

This paper will start by mentioning some of the most advanced reflective optics for telescopes, weighting them against those of advanced EUV lithography, and going on to advocate for a reliability approach (trust) bridging technology (including EUV lithography) and system design for advanced CMOS silicon technology (dust). Focusing on the (un)reliability of nanometer transistors, the fact that chips fabricated in 5nm CMOS silicon technology require EUV tools which use holistic lithographic approaches is indirectly making the case for the potential of a much closer integration of circuit design with technology (currently only mildly connected), under a holistic design umbrella.