材料科学
氮化物
表征(材料科学)
涂层
陶瓷
冶金
氮化硅
X射线光电子能谱
氮化硼
锡
氮化铬
纳米技术
图层(电子)
作者
Chia-Han Lai,Su-Jien Lin,Jien-Wei Yeh,Shou-Yi Chang
标识
DOI:10.1016/j.surfcoat.2006.06.048
摘要
Multi-element nitride films of AlCrTaTiZr high-entropy alloy have been prepared in this study by reactive radio-frequency magnetron sputtering. The influences of nitrogen flow ratio on the chemical composition, microstructure and mechanical properties of the deposited nitride films have been investigated. The AlCrTaTiZr alloy film exhibited an amorphous structure, while a simple face-center-cubic solid-solution structure was observed in the nitride films prepared under different nitrogen flow ratios. The multi-element AlCrTaTiZr nitride films exhibited much improved mechanical properties as compared with conventional nitride hard coatings of transition metals.
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